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Definition of "chemical vapor deposition (CVD)" |
A method of depositing thin semiconductor films. With this method, a substrate is exposed to one or more vaporized compounds, one or more of which contain desirable constituents. A chemical reaction is initiated, at or near the substrate surface, to produce the desired material that will condense on the substrate. / a process used in the manufacture of integrated circuits or optical fibers whereby a thin solid film of one material is deposited on the surface of another by using a radio frequency or other electrical energy source to dissociate a reactive gas. |
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